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首页> 外文期刊>Materials Research Bulletin >A study on the electrical properties of Pb(Zr, Ti)O_3 thin films crystallized by the electrical resistive heating of Pt thin film
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A study on the electrical properties of Pb(Zr, Ti)O_3 thin films crystallized by the electrical resistive heating of Pt thin film

机译:Pt薄膜电阻加热结晶的Pb(Zr,Ti)O_3薄膜的电学特性研究

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摘要

The electrical properties of Pb(Zr, Ti)O_3 thin films annealed by Pt thin film heater were investigated. By the thin film heater, we successfully crystallized Pb(Zr, Ti)O_3 thin films at a high temperature above 750 ℃ in a few seconds. The thin film heater has some advantages, such as a low thermal budget, little Pb-loss and enhanced surface morphology compared with the conventional furnace because it has a fast heating rate. The electrical properties of the Pb(Zr, Ti)O_3 thin film crystallized by thin film heater improved considerably comparing to those crystallized in conventional furnace. The remanent polarization, breakdown field, and leakage current density measured to be 22.7 μC/cm~2, 853 kV/cm, and 6.93 × 10~(-7) A/cm~2, respectively.
机译:研究了Pt薄膜加热器退火后的Pb(Zr,Ti)O_3薄膜的电性能。通过薄膜加热器,我们在几秒钟内成功地在750℃以上的高温下结晶了Pb(Zr,Ti)O_3薄膜。与常规炉相比,薄膜加热器具有一些优点,例如,热预算低,Pb损失少,表面形态增强,因为它具有快速的加热速率。与常规炉中结晶的那些相比,通过薄膜加热器结晶的Pb(Zr,Ti)O_3薄膜的电学性能大大提高。剩余极化强度,击穿场和泄漏电流密度分别为22.7μC/ cm〜2、853 kV / cm和6.93×10〜(-7)A / cm〜2。

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