Low temperature deposition of Ba_0.4 Sr_0.6 TiO_3 thin films on LaNiO_3-buffered electrode by rf magnetron sputtering

摘要

Sputter-deposited LaNiO_3 (LNO) was used as a conductive buffer layer for the deposition of 80 nm thick (Ba_0.4 Sr_0.6)TiO_3 (BST) thin films of Pt/Ti/SiO_2/Si substrates by rf magnetron sputtering. Smooth and highly (100)-oriented perovskite films of BST were grown on the (100)-textured LNO by deposition at temperatures ≥200 deg. C. However, a relatively rough and weakly crystallized BST film was obtained by deposition directly on Pt/ Ti/SiO_2/Si substrates at 500 deg. C. A stoichiometric composition of BST films was closely reached by using the target having 30-40 mol/100 enrichment of Ba + Sr.