机译:射频磁控溅射技术在室温下在透明TPT衬底上制备ZnO:Al薄膜
Department of Electronics Science & Technology, Huazhong University of Science & Technology, Wuhan 430074, China Hubei PV center of Engineering & Technology, Wuhan 430074, China;
Department of Electronics Science & Technology, Huazhong University of Science & Technology, Wuhan 430074, China;
Department of Electronics Science & Technology, Huazhong University of Science & Technology, Wuhan 430074, China;
Department of Electronics Science & Technology, Huazhong University of Science & Technology, Wuhan 430074, China Hubei PV center of Engineering & Technology, Wuhan 430074, China;
Department of Electronics Science & Technology, Huazhong University of Science & Technology, Wuhan 430074, China Hubei PV center of Engineering & Technology, Wuhan 430074, China;
Al-doped ZnO (ZnO:Al); flexible substrate; magnetron sputtering; solar energy materials; thin films; deposition;
机译:衬底温度对射频磁控溅射制备透明导电Al和F共掺杂ZnO薄膜的影响
机译:射频磁控溅射法在低温度下沉积透明导电ZnO:Al薄膜
机译:氩气气压对磁控溅射室温下沉积在柔性TPT衬底上的ZnO:Al膜的影响
机译:溅射气压和衬底温度对射频磁控溅射制备ZnO:Al薄膜光学性能的影响
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机译:ZnF2掺杂的ZnO靶在不同溅射衬底温度下沉积F掺杂的ZnO透明薄膜
机译:各种衬底温度对RF磁控溅射沉积的ZnO薄膜结构和电性能的依赖性