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Effect of substrate temperature on transparent conducting Al and F co-doped ZnO thin films prepared by rf magnetron sputtering

机译:衬底温度对射频磁控溅射制备透明导电Al和F共掺杂ZnO薄膜的影响

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ZnO is a wide bandgap semiconductor that has many potential applications such as solar cells, thin film transistors, light emitting diodes, and gas/biological sensors. In this study, a composite ceramic ZnO target containing 1 wt% Al2O3 and 1.5 wt% ZnF2 was prepared and used to deposit transparent conducting Al and F co-doped zinc oxide (AFZO) thin films on glass substrates by radio frequency magnetron sputtering. The effect of substrate temperatures ranging from room temperature (RT) to 200 degrees C on structural, morphological, electrical, chemical, and optical properties of the deposited thin films were investigated by X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), atomic force microscopy (AFM), Hall effect measurement, X-ray photoelectron spectroscopy, secondary ion mass spectrometry, and UV-vis spectrophotometer. The XRD results showed that all the AFZO thin films had a (002) diffraction peak, indicating a typical wurtzite structure with a preferential orientation of the c-axis perpendicular to the substrate. The FE-SEM and AFM analyses indicated that the crystallinity and grain size of the films were enhanced while the surface roughness decreased as the substrate temperature increased. Results of Hall effect measurement showed that Al and F co-doping decreased the resistivity more effectively than single-doping (either Al or F doping) in ZnO thin films. The resistivity of the AFZO thin films decreased from 5.48 x 10(-4) to 2.88 x 10(-4) Omega-cm as the substrate temperature increased from RT to 200 degrees C due to the increased carrier concentration and Hall mobility. The optical transmittances of all the AFZO thin films were over 92% in the wavelength range of 400-800 nm regardless of substrate temperature. The blue-shift of absorption edge accompanied the rise of the optical band gap, which conformed to the Burstein-Moss effect. The developed AFZO thin films are suitable as transparent conducting electrodes for various optoelectronic applications. (C) 2016 Elsevier B.V. All rights reserved.
机译:ZnO是一种宽带隙半导体,具有许多潜在应用,例如太阳能电池,薄膜晶体管,发光二极管和气体/生物传感器。在这项研究中,制备了包含1 wt%的Al2O3和1.5 wt%的ZnF2的复合陶瓷ZnO靶,并通过射频磁控溅射在玻璃基板上沉积透明导电Al和F共掺杂的氧化锌(AFZO)薄膜。通过X射线衍射(XRD),场发射扫描电子显微镜(RT)研究了从室温(RT)到200摄氏度的衬底温度对沉积薄膜的结构,形态,电学,化学和光学性质的影响( FE-SEM),原子力显微镜(AFM),霍尔效应测量,X射线光电子能谱,二次离子质谱和紫外可见分光光度计。 X射线衍射结果表明,所有AFZO薄膜均具有(002)衍射峰,表明典型的纤锌矿结构具有垂直于基板的c轴优先取向。 FE-SEM和AFM分析表明,随着基底温度的升高,薄膜的结晶度和晶粒尺寸得到增强,而表面粗糙度降低。霍尔效应测量结果表明,Al和F共掺杂比ZnO薄膜中的单掺杂(Al或F掺杂)更有效地降低了电阻率。随着载流子浓度和霍尔迁移率的增加,基板温度从RT升高到200摄氏度,AFZO薄膜的电阻率从5.48 x 10(-4)降低到2.88 x 10(-4)Ω-cm。无论基板温度如何,所有AFZO薄膜的透光率在400-800 nm的波长范围内均超过92%。吸收边缘的蓝移伴随着光学带隙的增加,这与Burstein-Moss效应相符。开发的AFZO薄膜适合用作各种光电应用的透明导电电极。 (C)2016 Elsevier B.V.保留所有权利。

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