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Dependences of Various Substrate Temperature on the Structural and Electrical Properties of ZnO Thin Films deposited by RF Magnetron Sputtering

机译：各种衬底温度对RF磁控溅射沉积的ZnO薄膜结构和电性能的依赖性

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1. Effect of substrate temperature on the structural, electrical and optical properties of ZnO:Ga thin films prepared by RF magnetron sputtering [J] . Wu F., Fang L., Pan Y.J., Physica, E. Low-dimensional systems & nanostructures . 2010,第1期

机译：衬底温度对射频磁控溅射制备ZnO：Ga薄膜的结构，电学和光学性质的影响
2. Structural and Electrical Properties of High Temperature Deposited Epitaxial ZnO Thin Film Fabricated by RF Magnetron Sputtering [J] . Dong Hun Kim, Nam Gyu Cho, Hun Park Integrated Ferroelectrics . 2007,第1期

机译：射频磁控溅射制备高温沉积外延ZnO薄膜的结构和电性能
3. Effect of substrate temperature on the structural, electrical, and optical properties of GZO/ZnO films deposited by radio frequency magnetron sputtering [J] . Sun-Kyung Kim, Seung-Hong Kim, So-Young Kim CERAMICS INTERNATIONAL . 2014,第5期

机译：基板温度对射频磁控溅射沉积的GZO / ZnO薄膜的结构，电学和光学性质的影响
4. Substrate temperature dependence of nanoparticle ZnO thin films deposited on flexible substrates by RF magnetron sputtering [C] . Sauki Nur Saradah Muhamad, Herman Sukreen Hana, Mahmood Mohamad Rusop 2012 International Conference on Enabling Science and Nanotechnology . 2012

机译：射频磁控溅射沉积在柔性基板上的纳米ZnO薄膜的基板温度依赖性
5. Characterization of piezoelectric aluminum nitride thin films deposited on silicon by RF reactive magnetron sputtering at low temperature for acoustic wave devices [D] . Mirfazli, Akhtar 2004

机译：射频反应磁控溅射在低温下沉积在硅上的压电氮化铝薄膜的声波器件特性
6. Processing and Study of Optical and Electrical Properties of (Mg Al) Co-Doped ZnO Thin Films Prepared by RF Magnetron Sputtering for Photovoltaic Application [O] . Chayma Abed, Susana Fernández, Selma Aouida, 2020

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7. Thickness Dependence of Microstructures and Electrical and Optical Properties of ZnO Thin Films Deposited by RF Magnetron Sputtering [O] . 清水秀己, 大塚一毅 2017

机译：射频磁控溅射沉积ZnO薄膜的微观结构及其电学和光学性质的厚度依赖性

Dependences of Various Substrate Temperature on the Structural and Electrical Properties of ZnO Thin Films deposited by RF Magnetron Sputtering

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