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Enhanced photovoltaic properties in polycrystalline BiFeO_3 thin films with rhombohedral perovskite structure deposited on fluorine doped tin oxide substrates

机译:在氟掺杂的氧化锡衬底上沉积具有菱面体钙钛矿结构的多晶BiFeO_3薄膜中增强的光伏性能

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摘要

Polycrystalline BiFeO_3 thin films have been deposited on fluorine doped tin oxide substrates successfully through a modified chemical solution deposition process based on using N,N-dimethyl-formamide as solvent. Structural analyses show that, N,N-dimethylformamide is beneficial to reduce the structural strain, and hence rhombohedral BiFeO_3 films rather than the conventional pseudocubic ones were obtained. Absorption spectrum indicates that the modified process derived rohombohedral BiFeO_3 has a narrower band gap (2.54 eV) than that of the conventional process derived pseudocubic BiFeO_3 (2.76 eV). The BiFeO_3 shows good photovoltaic properties with indium tin oxide as top electrode. The short circuit current density and open circuit voltage of the heterojunctions are measured to be 0.13 mA/cm~2 and 0.65 V, respectively, much higher than the reported values for the conventional process derived pseudocubic BiFeO_3 based heterojunctions. Our results indicate that the modified process derived rhombohedral BiFeO_3 can induce higher photovoltaic effect compared with the conventional process derived pseudocubic counterpart.
机译:在N,N-二甲基甲酰胺为溶剂的基础上,通过改进的化学溶液沉积工艺,成功地在掺氟氧化锡衬底上沉积了多晶BiFeO_3薄膜。结构分析表明,N,N-二甲基甲酰胺有利于减小结构应变,从而得到菱形BiFeO_3薄膜,而不是常规的伪立方薄膜。吸收光谱表明,与常规方法衍生的假立方BiFeO_3(2.76 eV)相比,改性方法衍生的六面体BiFeO_3具有更窄的带隙(2.54 eV)。 BiFeO_3以氧化铟锡作为顶部电极显示出良好的光电性能。异质结的短路电流密度和开路电压经测量分别为0.13 mA / cm〜2和0.65 V,远高于基于传统工艺的基于伪立方BiFeO_3的异质结的报道值。我们的结果表明,与常规工艺衍生的假立方晶体相比,改性工艺衍生的菱形BiFeO_3可以诱导更高的光伏效应。

著录项

  • 来源
    《Materials Letters》 |2012年第2012期|p.140-142|共3页
  • 作者单位

    State Key Laboratory of MMCs, School of Materials Science and Engineering, Shanghai Jiaotong University, Shanghai 200240, China;

    State Key Laboratory of MMCs, School of Materials Science and Engineering, Shanghai Jiaotong University, Shanghai 200240, China;

    State Key Laboratory of MMCs, School of Materials Science and Engineering, Shanghai Jiaotong University, Shanghai 200240, China;

    State Key Laboratory of MMCs, School of Materials Science and Engineering, Shanghai Jiaotong University, Shanghai 200240, China;

    State Key Laboratory of MMCs, School of Materials Science and Engineering, Shanghai Jiaotong University, Shanghai 200240, China;

    State Key Laboratory of MMCs, School of Materials Science and Engineering, Shanghai Jiaotong University, Shanghai 200240, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    ferroelectric thin films; BiFeO_3; chemical solution deposition; photovoltaic effect;

    机译:铁电薄膜BiFeO_3;化学溶液沉积;光电效应;

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