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Fluorine highly doped nanocrystalline SnO2 thin films prepared by SPD technique

机译:SPD技术制备的氟高掺杂纳米晶SnO2薄膜

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Pure and fluorine highly doped SnO2 (TO and PTO) thin films with different dopant concentrations (0.15, 0.25, 0.35 mol/l) have been prepared by spray pyrolysis technique at substrate temperature 450 degrees C. The crystal structure and surface morphology of the prepared films were characterized by using X-ray diffraction and scanning electron microscopy SEM. The XRD patterns show polycrystalline structure in nature with tetragonal (rutile) phase. The average crystallite size decreases with increasing of dopant concentrations and its values in the range (32-56) nm which indicate that all films have nanocrystalline structure. The SEM images show a homogeneous and smooth uniform surface with no detectable microcracks, the EDX spectra confirm the stoichiometry of the prepared films. The optical properties of the films were investigated by UV-vis spectrophotometer. In the visible range, the optical transmittance (T%) of the films with varying dopant concentrations was found to be (83-98)% and the fundamental absorption edge shifted toward higher energies (blue shift) with increasing of fluorine dopant concentration. The energy band gap value of pure SnO2 was 3.95 eV and it increases to 4.04, 4.08 and 4.1 eV with the increasing of dopant concentration, this behaviors can be attribute to the (B.M) effect or Burstein-Moss shift. (C) 2015 Elsevier B.V. All rights reserved.
机译:通过喷涂热解技术在450℃的衬底温度下制备了不同掺杂浓度(0.15、0.25、0.35 mol / l)的纯SnO 2和氟高掺杂SnO 2(TO和PTO)薄膜。制备的晶体结构和表面形态通过使用X射线衍射和扫描电子显微镜SEM对膜进行表征。 XRD图显示出具有四方(金红石)相的自然多晶结构。平均晶粒尺寸随掺杂剂浓度的增加而减小,并且其值在(32-56)nm范围内,这表明所有薄膜均具有纳米晶体结构。 SEM图像显示出均匀且光滑的均匀表面,没有可检测到的微裂纹,EDX光谱证实了所制备膜的化学计量。通过紫外可见分光光度计研究膜的光学性质。在可见光范围内,发现掺杂剂浓度变化的薄膜的透光率(T%)为(83-98)%,并且随着氟掺杂剂浓度的增加,基本吸收边移向更高的能量(蓝移)。纯SnO2的能带隙值为3.95 eV,随着掺杂剂浓度的增加,能带隙值增加到4.04、4.08和4.1 eV,这种行为可以归因于(B.M)效应或Burstein-Moss位移。 (C)2015 Elsevier B.V.保留所有权利。

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