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Growth and Characterization of CulnS_2 Thin Films for Photovoltaic Applications

机译:光伏应用中CulnS_2薄膜的生长与表征

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In this paper, CuInS_(2) thin films were prepared by spray pyrolysis method at different substrate temperatures (T_(s) ). The obtained films were characterized by Raman spectroscopy, UV-Vis spectrophotometer and 4-point probe technique. The results showed thatall of the spray pyrolyzed thin films have chalcopyrite structures. The CuInS_(2) thin films elaborated at 375 °C for 30 min possessing 1.47 eV direct band gap. The observed band gap value for HK-R2 (1.47 eV) is very close to the theoretical band gap value of CuInS_(2).The value of the direct band gap would increase with increasing the substrate temperature. The resistivity of films increases from 5.47 × 10~(–2) to 6.33 × 10~(+1) Ω · cm with the increase in the substrate temperature from 350 °C to 400 °C.For CuInS_(2) thin films, properties like structural, optical and electrical showed progressive behavior with substrate temperature.
机译:在本文中,通过喷雾热解法在不同的衬底温度(iT_(s))下制备了CuInS_(2)薄膜。通过拉曼光谱,紫外可见分光光度计和四点探针技术对所得膜进行表征。结果表明,所有喷雾热解薄膜均具有黄铜矿结构。 CuInS_(2)薄膜在375°C下精细加工30分钟,具有1.47 eV的直接带隙。 HK-R2的观察到的带隙值(1.47 eV)非常接近CuInS_(2)的理论带隙值。直接带隙的值会随着基板温度的升高而增加。随着基板温度从350°C升高到400°C,薄膜的电阻率从5.47×10〜(–2)增加到6.33×10〜(+1)Ω·cm。对于CuInS_(2)薄膜,诸如结构,光学和电学之类的特性表现出随衬底温度的渐进行为。

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