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Process Parameter Impact on Selective Laser Ablation of Bilayer Molybdenum Thin Films for CIGS Solar Cell Applications

机译:工艺参数对CIGS太阳能电池用双层钼薄膜选择性激光烧蚀的影响

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摘要

Cu(In,Ga)Se_(2) or CIGS absorber layers are a promising candidate for thin film solar cells, with efficiency exceeding 22% having already been demonstrated at the cell level and their commercialization been ramped up. Scribing by selective ablation to achieve monolithic integrationis an essential step in CIGS module making to divide a large area cell into a series of inter-connected smaller cells. P1 scribing or electrical isolation of back contact is an essential part of the monolithic integration. Laser-induced scribing of Molybdenum (Mo) back contact of a CIGS solarcell is highly sensitive to process parameters like laser power, pulse duration, and pulse repetition frequency. The above parameters control the scribe width, heat affected zone and process residue directly or indirectly, thereby affecting electrical isolation and module performance. Influenceof laser process parameters on scribing of a bilayer Mo thin film back contact has been investigated and is being reported. The scribes obtained employing various laser conditions were characterized for electrical isolation and analyzed by optical microscopy followed by profilometry. High-qualityscribing, with a scribe width of 53 μ m over a length of 300 mm, was achieved on a bilayer Mo thin film sputtered on a Soda lime glass substrate.
机译:Cu(In,Ga)Se_(2)或CIGS吸收层是薄膜太阳能电池的有前途的候选材料,在电池级别已证明效率超过22%,并且其商业化得到了加速。通过选择性烧蚀进行划刻以实现单片集成是CIGS模块制造中必不可少的步骤,该模块使大面积的单元划分为一系列相互连接的较小单元。背面触点的P1划刻或电隔离是单片集成的重要组成部分。激光诱导的CIGS太阳能电池的钼(Mo)背触点划线对诸如激光功率,脉冲持续时间和脉冲重复频率之类的工艺参数高度敏感。以上参数直接或间接控制划线宽度,热影响区和工艺残留物,从而影响电气隔离和模块性能。已经研究了激光工艺参数对双层Mo薄膜背面触点刻划的影响,并有报道。对采用各种激光条件获得的划痕进行电隔离并通过光学显微镜和轮廓测定法进行分析。在溅射在苏打石灰玻璃基板上的双层Mo薄膜上实现了划痕宽度为300毫米,划线宽度为53μm的高质量刻划。

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