首页> 外文期刊>The Korean journal of chemical engineering >Hydrophobic properties of films grown by torch-type atmospheric pressure plasma in Ar ambient containing C6 hydrocarbon precursor
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Hydrophobic properties of films grown by torch-type atmospheric pressure plasma in Ar ambient containing C6 hydrocarbon precursor

机译:火炬型常压等离子体在含C6碳氢化合物前驱体的Ar环境中的疏水性

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摘要

The direct deposition of polymeric films with a torch-type atmospheric pressure plasma using benzene, n-hexane and cyclohexane in Ar was performed on several substrates. The surface morphologies of the films deposited with n-hexane and cyclohexane were uniformly smooth for all deposition thicknesses, and the typical water contact angle on the films indicating the degree of hydrophobicity was about 85°. However, the films deposited using benzene had a micro-coarse surface morphology and showed a superhydrophobic property with a water contact angle exceeding 150". Some trace of oxygen incorporation was shown in all films due to the plasma deposition process in an air ambient. The small amount of oxygenated species did not lead to a decrease of hydrophobicity of the films.
机译:使用炬,大气压等离子体,在Ar中使用苯,正己烷和环己烷在Ar中直接沉积聚合物膜。对于所有沉积厚度,用正己烷和环己烷沉积的薄膜的表面形态均一地平滑,并且薄膜上的典型水接触角表明疏水性约为85°。但是,用苯沉积的薄膜具有微粗糙的表面形态,并且具有超疏水性,水接触角超过150英寸。由于在空气环境中的等离子体沉积过程,所有薄膜中都显示出一些氧结合的痕迹。少量的氧化物质不会导致薄膜疏水性的降低。

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