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首页> 外文期刊>Journal of Vacuum Science & Technology >Growth of and optical emission from GaMnAs thin films grown by molecular beam epitaxy
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Growth of and optical emission from GaMnAs thin films grown by molecular beam epitaxy

机译:GaMnAs薄膜的分子束外延生长及光发射

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摘要

GaMnAs thin films with different Mn doping concentrations were grown via molecular beam epitaxy using a substrate temperature of 250℃. The thin films were investigated using photoluminescence (PL) measurements from 8 to 300 K. Transitions involving Mn acceptors were identified and a binding energy of ~0.1 eV was found. A Mn doping concentration dependent PL spectrum was found to lend insight into the film quality at a local level. Temperature dependent PL studies show that the doping related emissions drop faster in energy than other peaks with increasing temperature, indicating that they are more sensitive to changes in the surrounding environment.
机译:通过分子束外延法在250℃的衬底温度下生长不同Mn掺杂浓度的GaMnAs薄膜。使用8至300 K的光致发光(PL)测量研究了薄膜。鉴定了涉及Mn受体的跃迁,发现了约0.1 eV的结合能。发现锰掺杂浓度依赖的PL光谱有助于在局部水平上了解膜质量。温度相关的PL研究表明,随着温度的升高,与掺杂有关的发射在能量上的下降速度要快于其他峰,这表明它们对周围环境的变化更加敏感。

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