Growth scaling of metal oxide columnar thin films deposited by glancing angle depositions

摘要

The self-similar growth scaling of TiO_2, SiO_2, and Al_2O_3 vertical post-glancing-angle deposited films has been characterized. Films were deposited using three deposition systems and four different deposition conditions. For a given film, good agreement was found with a self-similar growth model w(h) = w_0h~p. For the materials studied here, p was found to increase with deposition angle, in contrast to some previous literature reports. Values of 0.017 ±0.005, 0.011 ±0.005, and 0.014 ± 0.005 deg~(-1) were found for TiO_2, SiO_2, and Al_2O_3, respectively.