Effects of oxygen flooding on crater bottom composition and roughness in ultrashallow secondary ion mass spectrometry depth profiling

摘要

The effect of oxygen flooding during ultrashallow depth profiling using secondary ion mass spectrometry (SIMS) was studied on a silicon sample implanted with 2 keV boron. SIMS depth profiles were obtained on a Cameca IMS6f using low energy (1 keV) O~+_2 primary beams at 56deg incident angle. Different oxygen flooding conditions were used to investigate the dependence of crater bottom composition and roughening on oxygen partial pressure.