Fabrication of an infrared antenna-coupled microbolometer linear array using chrome as a mask

摘要

The fabrication of a linear array of antenna-coupled mi-crobolometer with critical linewidths of 90 nm has been demonstrated using electron beam lithography in conjunction with a RIE with chromium as a mask. There are two issues that must be addressed to further improve the performance of the linear array. The first is that the effective wavelength of 2.5 μm from Ref. 6 needs to be more precisely determined, which will lead to an enhancement of the signal to noise ratio. The second is that a study on the antenna coupling between the individual antenna elements needs to be investigated to improve the performance of the array. This work demonstrates a unique method of fabrication for a linear array of antenna-coupled microbolometers with a resolution of 90 nm. Improvements on this device could lead to the development of an uncooled two-dimensional focal plane array of antenna-coupled IR sensors.