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Tungsten pedestal structure for nanotriode devices

机译:纳米三极管器件的钨基架结构

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The nanotriode is a vacuum nanoelectronic device with a turn-on voltage for a field emission of similar to8 V, in which electrons are emitted from a metal nanotip with a radius similar to1 nm in an integrated vacuum chamber, over a distance of similar to100 nm. However, surface breakdown Of the gate-cathode dielectric within the device chamber occurs similar to2 V outside of its operating range, limiting the reliable range of field-emission observation. To increase this surface breakdown voltage, while maintaining the operating voltage range, a pedestal structure has been developed that can be incorporated into the nanotriode. This structure has a thicker dielectric layer, while maintaining a gate-cathode separation similar to that used previously. Measurements on vacuum-encapsulated two-terminal devices show field emission in the same voltage range and with similar characteristics to those previously observed; in consequence of the pedestal, higher surface breakdown voltages are achieved and the significance of the leakage current is reduced. (C) 2004 American Vacuum Society.
机译:纳米三极管是一种具有开启电压的真空纳米电子器件,用于产生类似于8 V的场发射,其中电子在集成真空腔中从半径约为1 nm的金属纳米尖端发射,距离约为100 nm。 。但是,器件腔室内栅阴极电介质的表面击穿类似于其工作范围之外的2 V发生,从而限制了场发射观测的可靠范围。为了增加该表面击穿电压,同时保持工作电压范围,已经开发出可以并入纳米三极管中的基座结构。这种结构具有较厚的介电层,同时保持了与以前使用的栅-阴极分隔相似的栅-阴极分隔。在真空封装的两端子设备上进行的测量表明,在相同的电压范围内具有与先前观察到的特性相似的场发射。由于基座的原因,可获得更高的表面击穿电压,并且降低了漏电流的重要性。 (C)2004年美国真空学会。

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