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Carbohydrate-Assisted Combustion Synthesis To Realize High-Performance Oxide Transistors

机译:碳水化合物辅助燃烧合成以实现高性能氧化物晶体管

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摘要

Owing to high carrier mobilities, good environmental/thermal stability, excellent optical transparency, and compatibility with solution processing, thin-film transistors (TFTs) based on amorphous metal oxide semiconductors (AOSs) are promising alternatives to those based on amorphous silicon (a-Si:H) and low-temperature (<600 ℃) poly-silicon (LTPS). However, solution-processed display-relevant indium-gallium-tin-oxide (IGZO) TFTs suffer from low carrier mobilities and/or inferior bias-stress stability versus their sputtered counterparts. Here we report that three types of environmentally benign carbohydrates (sorbitol, sucrose, and glucose) serve as especially efficient fuels for IGZO film combustion synthesis to yield high-performance TFTs. The results indicate that these carbohydrates assist the combustion process by lowering the ignition threshold temperature and, for optimal stoichiometries, enhancing the reaction enthalpy. IGZO TFT mobilities are increased to >8 cm~2 V~(-1) s~(-1) on SiO_2/Si gate dielectrics with significantly improved bias-stress stability. The first correlations between precursor combustion enthalpy and a-MO densification/charge transport are established.
机译:由于载流子迁移率高,良好的环境/热稳定性,出色的光学透明性以及与溶液处理的兼容性,基于非晶金属氧化物半导体(AOS)的薄膜晶体管(TFT)是基于非晶硅(a- Si:H)和低温(<600℃)多晶硅(LTPS)。但是,与溅射工艺相比,与溶液处理相关的与显示器相关的铟镓锡氧化物(IGZO)TFT的载流子迁移率低和/或偏置应力稳定性差。在这里,我们报告三种对环境有益的碳水化合物(山梨糖醇,蔗糖和葡萄糖)作为IGZO膜燃烧合成以生产高性能TFT的特别有效的燃料。结果表明,这些碳水化合物可通过降低点火阈值温度来辅助燃烧过程,并且对于最佳化学计量比,可提高反应焓。在SiO_2 / Si栅极电介质上,IGZO TFT迁移率增加到> 8 cm〜2 V〜(-1)s〜(-1),偏置应力稳定性得到显着改善。建立了前驱体燃烧焓与α-MO致密化/电荷传输之间的第一相关性。

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  • 来源
    《Journal of the American Chemical Society》 |2016年第22期|7067-7074|共8页
  • 作者单位

    Department of Chemistry and the Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States,Institute of Functional Nano & Soft Materials (FUNSOM), Jiangsu Key Laboratory for Carbon-Based Functional Materials and Devices, Soochow University, 199 Ren'ai Road, Suzhou 215123, China;

    Applied Physics Program, Materials Science and Engineering Department and the Materials Research Center, Northwestern University, 2220 Campus Drive, Evanston, Illinois 60208, United States;

    Department of Chemistry and the Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States;

    Department of Chemistry and the Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States;

    Polyera Corporation, 8045 Lamon Avenue, Skokie, Illinois 60077, United States;

    Institute of Functional Nano & Soft Materials (FUNSOM), Jiangsu Key Laboratory for Carbon-Based Functional Materials and Devices, Soochow University, 199 Ren'ai Road, Suzhou 215123, China;

    Applied Physics Program, Materials Science and Engineering Department and the Materials Research Center, Northwestern University, 2220 Campus Drive, Evanston, Illinois 60208, United States;

    Department of Chemistry and the Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States,Applied Physics Program, Materials Science and Engineering Department and the Materials Research Center, Northwestern University, 2220 Campus Drive, Evanston, Illinois 60208, United States;

    Department of Chemistry and the Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States,Polyera Corporation, 8045 Lamon Avenue, Skokie, Illinois 60077, United States;

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