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From the Cover: Spray-combustion synthesis: Efficient solution route to high-performance oxide transistors

机译:从封面开始:喷雾燃烧合成:通往高性能氧化物晶体管的高效解决方案

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摘要

Metal-oxide (MO) semiconductors have emerged as enabling materials for next generation thin-film electronics owing to their high carrier mobilities, even in the amorphous state, large-area uniformity, low cost, and optical transparency, which are applicable to flat-panel displays, flexible circuitry, and photovoltaic cells. Impressive progress in solution-processed MO electronics has been achieved using methodologies such as sol gel, deep-UV irradiation, preformed nanostructures, and combustion synthesis. Nevertheless, because of incomplete lattice condensation and film densification, high-quality solution-processed MO films having technologically relevant thicknesses achievable in a single step have yet to be shown. Here, we report a low-temperature, thickness-controlled coating process to create high-performance, solution-processed MO electronics: spray-combustion synthesis (SCS). We also report for the first time, to our knowledge, indium-gallium-zinc-oxide (IGZO) transistors having densification, nanoporosity, electron mobility, trap densities, bias stability, and film transport approaching those of sputtered films and compatible with conventional fabrication (FAB) operations.
机译:由于金属氧化物(MO)半导体具有很高的载流子迁移率,即使在非晶态,大面积均匀性,低成本和光学透明性等方面也具有很高的载流子迁移率,它们已成为下一代薄膜电子产品的使能材料。面板显示器,柔性电路和光伏电池。使用诸如溶胶凝胶,深紫外辐射,预制的纳米结构和燃烧合成等方法,在固溶处理的MO电子产品中取得了令人印象深刻的进步。然而,由于不完全的晶格凝结和膜致密化,具有在单个步骤中可获得的技术上相关的厚度的高质量的固溶处理的MO膜尚未被展示。在这里,我们报告了一种低温,厚度受控的镀膜工艺,以创建高性能的,经过溶液处理的MO电子产品:喷雾燃烧合成(SCS)。据我们所知,我们还首次报告了具有致密化,纳米孔,电子迁移率,陷阱密度,偏压稳定性和膜传输性接近溅射膜且与常规制造兼容的铟镓锌氧化物(IGZO)晶体管。 (FAB)操作。

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