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Electrochemical properties of LiFePO_4 thin films prepared by pulsed laser deposition

机译:脉冲激光沉积制备的LiFePO_4薄膜的电化学性能

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Lithium iron phosphate (LiFePO_4) thin film electrodes were prepared by pulsed laser deposition (PLD). The thin films were annealed at various temperatures under argon gas flow and the influence of annealing temperature on their electrochemical performance was studied. The thin films annealed at 773 and 873 K exhibited a couple of redox peaks at 3.4 V (versus Li/Li~+) that are characteristics of the electrochemical lithium insertion/extraction of LiFePO_4. Atomic force microscopy (AFM) observation revealed that the film annealed at 773 K (773K-film) consisted of small grains with 50 nm in thickness, and the grain size increased with an increase of annealing temperature. Because of its small-sized grains, the 773 K-film showed high rate capability and the discharge capacity at 10 mu A maintained 65 percent of that at 25 nA. However, the discharge capacity of the 773 K-film was ca. 10 percent smaller than that of the film annealed at 873 K, indicating that annealing at 773 K is slightly insufficient to obtain well-crystallized LiFePO_4. From these results, it was concluded that a point of optimization between high rate capability and capacity would be found between 773 and 873 K.
机译:通过脉冲激光沉积(PLD)制备磷酸铁锂(LiFePO_4)薄膜电极。薄膜在氩气流下于不同温度退火,研究了退火温度对其电化学性能的影响。在773和873 K下退火的薄膜在3.4 V处出现了一对氧化还原峰(相对于Li / Li〜+),这是LiFePO_4的电化学锂插入/萃取的特征。原子力显微镜(AFM)观察表明,在773 K退火的膜(773K膜)由厚度为50 nm的小晶粒组成,并且晶粒尺寸随退火温度的升高而增加。由于773 K膜的晶粒较小,因此显示出高倍率能力,在10μA时的放电容量保持25 nA时的65%。但是,773 K薄膜的放电容量约为。比在873 K退火的薄膜小10%,这表明在773 K退火略微不足以获得结晶良好的LiFePO_4。从这些结果可以得出结论,将在773 K和873 K之间找到高速率能力和容量之间的优化点。

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