首页> 外文期刊>Journal of neural engineering >Comparison of electrically evoked cortical potential thresholds generated with subretinal or suprachoroidal placement of a microelectrode array in the rabbit
【24h】

Comparison of electrically evoked cortical potential thresholds generated with subretinal or suprachoroidal placement of a microelectrode array in the rabbit

机译:视网膜下或脉络膜上放置微电极阵列在兔中产生的电诱发皮质电位阈值的比较

获取原文
获取原文并翻译 | 示例

摘要

The aim of the study was to directly compare the threshold electrical charge density of the retina (retinal threshold) in rabbits for the generation of electrical evoked potentials (EEP) by delivering electrical stimulation with a custom-made microelectrode array (MEA) implanted into either the subretinal or suprachoroidal space. Nine eyes of seven Dutch-belted rabbits were studied. The electroretinogram (ERG), visual evoked potentials (VEP) and EEP were recorded. Electrodes for the VEP and EEP were placed on the dura mater overlying the visual cortex. The EEP was recorded following electrical stimulation of the MEA placed either subretinally beneath the visual streak of the retina or in the suprachoroidal space in the rabbit eye. An ab externo approach was used for placement of the MEA. Liquid perfluorodecaline (PFCL; 0.4 ml) was placed within the vitreous cavity to flatten the neurosensory retina on the MEA after subretinal implantation. The retinal threshold for generation of an EEP was determined for each MEA placement by three consecutive measurements consisting of 100 computer-averaged recordings. Animals were sacrificed at the conclusion of the experiment and the eyes were enucleated for histological examination. The retinal threshold to generate an EEP was 9 ± 7 nC (0.023 ± 0.016 mC cm~(-2)) within the subretinal space and 150 ± 122 nC (0.375 ± 0.306 mC cm~(-2)) within the suprachoroidal space. Histology showed disruption of the outer retina with subretinal but not suprachoroidal placement. The retinal threshold to elicit an EEP is significantly lower with subretinal placement of the MEA compared to suprachoroidal placement (P < 0.05). The retinal threshold charge density with a subretinal MEA is well below the published charge limit of 1 mC cm~(-2), which is the level below which chronic stimulation of the retina is considered necessary to avoid tissue damage.
机译:该研究的目的是通过对植入其中一个的定制微电极阵列(MEA)进行电刺激,直接比较兔的视网膜阈电荷密度(视网膜阈),以产生电诱发电位(EEP)。视网膜下或脉络膜上腔。研究了七只荷兰带状兔子的九只眼。记录视网膜电图(ERG),视觉诱发电位(VEP)和EEP。将VEP和EEP的电极置于硬膜上,覆盖视皮层。在对MEA进行电刺激后,将其记录在视网膜的视觉条纹下方或兔眼的脉络膜上腔中,然后记录EEP。使用外部吸收法放置MEA。视网膜下植入后,将全氟癸胺液体(PFCL; 0.4 ml)置于玻璃体腔内,以平整MEA上的神经感觉视网膜。通过三个连续的测量(由100个计算机平均记录组成),确定每个MEA位置的EEP产生的视网膜阈值。实验结束时处死动物,摘除眼睛进行组织学检查。产生EEP的视网膜阈值在视网膜下腔内为9±7 nC(0.023±0.016 mC cm〜(-2)),在脉络膜上腔内为150±122 nC(0.375±0.306 mC cm〜(-2))。组织学显示视网膜下膜破裂,但脉络膜上膜未见破裂。与膜上脉络膜上置放相比,MEA的视网膜下置放引起的EEP的视网膜阈值明显更低(P <0.05)。具有视网膜下MEA的视网膜阈值电荷密度远低于公开的电荷极限1 mC cm〜(-2),该水平低于该水平,认为必须长期刺激视网膜以避免组织损伤。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号