Optical and Surface Morphology Characterization of Nanometric Palladium Films on Silicon Substrates Annealed in Hydrogen Atmosphere

摘要

The influence of hydrogen (H_2) loading on optical and surface characteristics of nanometric palladium films was studied. Pd films were deposited on silicon substrates by electroless method. H_2 loading was realized by annealing the Pd films in H_2 atmosphere at 585 Torr over the temperature range of 200-500℃. Pd films with initial thickness under 40 nm were chosen to observe incomplete covering effects. Refractive index measurement was used to monitor the H_2 loading. Changes on refractive index and surface morphology are related to the existence of α and β phases in Pd-H system.