机译:大规模平行电子束光刻中用于纳米级光发射源的静电微柱设计
Purdue University, School of Mechanical Engineering, 585 Purdue Mall, West Latayette, Indiana 47907, United States;
Purdue University, School of Mechanical Engineering, 585 Purdue Mall, West Latayette, Indiana 47907, United States;
Purdue University, School of Mechanical Engineering, 585 Purdue Mall, West Latayette, Indiana 47907, United States;
electron-beam lithography; multiple beam direct write; electron optics; microcolumn; maskless lithography;
机译:大规模并行电子束光刻的电子设计自动化流程演示
机译:用于数字静电电子束阵列光刻的剂量控制电路
机译:数字静电电子束阵列光刻
机译:大量平行电子束光刻中带可变孔径的静电微柱的设计与制备
机译:一种热力学可变方法,用于建模归因于随机光刻结果和高k介电各向异性的纳米级MOS器件管芯内静电行为
机译:力反馈在聚合物笔平版印刷术的大规模并行阵列的流平
机译:由电子束光刻制造的纳米级铁磁环
机译:纳米级磁电子器件平行构图的纳米压印光刻技术