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Dislocation of high quality P-doped ZnTe substrate examined by X-ray topography

机译:X射线形貌研究了高质量P掺杂ZnTe衬底的位错

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Transmission X-ray topograph was successfully observed in a high quality P-doped ZnTe substrate (100). The dislocation density was estimated to be approximately 7000 cm(-2). This value was smallest in the ZnTe substrate. Both peak energies in the photoluminescence spectra were the same in the dislocation and no-dislocation areas. However, the intensity of the free-to-acceptor emission in the dislocation area was larger than that in the no-dislocation area. It was found that the majority of the phosphor impurities existed in the dislocation areas. (C) 2005 Springer Science + Business Media, Inc.
机译:在高质量的P掺杂ZnTe衬底(100)中成功观察到了透射X射线形貌图。位错密度估计约为7000 cm(-2)。该值在ZnTe衬底中最小。在位错和无位错区域,光致发光光谱中的两个峰值能量都相同。但是,位错区域的自由受主发射的强度大于无位错区域的自由受主的发射强度。发现大多数磷光体杂质存在于位错区域中。 (C)2005年Springer Science + Business Media,Inc.

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