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Thermal fatigue of Ag flake sintering die-attachment for Si/SiC power devices

机译:Si / SiC功率器件用银片烧结模头的热疲劳

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摘要

Emerging SiC power semiconductor devices are expected to work under the high temperature condition of 250-300 ℃ while the operation of Si devices is limited up to 180 ℃. The die-bonding materials for emerging SiC power devices hence need to have sufficient capability in such extreme operating environments. In this study, we investigated the thermomechanical reliability of the die-attach technology using Ag flake paste, which can be processed by low-temperature and low-pressure sintering. The Ag flakes start to sinter immediately after the organic dispersant layer is removed from the flake surface at 160 ℃, and die-bonding consequently becomes possible. The tested Si die-attachments joining with the paste maintained high strength (23 MPa) up to 1,000 thermal cycles from -40 to 180 ℃. The stable microstructures without crack and no interfacial debonding assure the reliability of the Ag flake paste die-attach of Si. SiC die-attachments also maintained their high strength (24 MPa) up to 1,000 cycles of -40 and 250 ℃, though a slight degradation appeared after 1,000 cycles. The debondings at the sintered Ag flake paste layer/SiC wafer interface were affected to the joining strength with the Ag flake paste. The obtained results indicate that our Ag flake paste die-attach can be applied to both Si and SiC power devices capable of high temperature operations.
机译:新兴的SiC功率半导体器件有望在250-300℃的高温条件下工作,而Si器件的工作温度限制在180℃。因此,用于新兴SiC功率器件的芯片键合材料需要在这种极端的工作环境中具有足够的能力。在这项研究中,我们研究了可使用低温和低压烧结处理的,使用Ag片状糊料的芯片固定技术的热机械可靠性。在160℃下从薄片表面除去有机分散剂层后,Ag薄片立即开始烧结,因此可以进行芯片键合。经过测试的与硅脂接合的Si模具附件在-40至180℃的高达1,000个热循环中均保持了高强度(23 MPa)。稳定的微结构,无裂纹,无界面脱粘,确保了硅片状银糊料模压附着的可靠性。 SiC模具连接件在-40和250℃的1,000次循环中也保持了高强度(24 MPa),尽管在1,000次循环后出现了轻微的降解。烧结后的Ag片状糊剂层/ SiC晶片界面处的剥离会影响与Ag片状糊剂的接合强度。所得结果表明,我们的银片糊模固连可以应用于能够进行高温操作的Si和SiC功率器件。

著录项

  • 来源
    《Journal of materials science》 |2013年第7期|2593-2601|共9页
  • 作者单位

    The Institute of Scientific and Industrial Research, Osaka University, Mihogaoka 8-1, Ibaraki, Osaka 567-0047, Japan;

    The Institute of Scientific and Industrial Research, Osaka University, Mihogaoka 8-1, Ibaraki, Osaka 567-0047, Japan;

    The Institute of Scientific and Industrial Research, Osaka University, Mihogaoka 8-1, Ibaraki, Osaka 567-0047, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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