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Reliability analysis of sintered Cu joints for SiC power devices under thermal shock condition

机译:SiC功率器件铜接头的热冲击可靠性分析。

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摘要

In this study, the thermal shock reliability of sintered Cu joints on SiC power device application was investigated. Firstly, sintered Cu joints were used to bond chips and substrate consisting of various materials to evaluate their bondability. Secondly, SiC dummy chips were bonded to DBC substrate and thermal shock test from -40 degrees C to 250 degrees C were performed both in the ambient atmosphere and in vacuum. Finally, the SiC MOSFETs bonded by sintered Cu joints were evaluated by power cycle test from 25 degrees C to 200 degrees C and the thermal conductivity was evaluated by T3ster equipment. The results showed the sintered Cu exhibited extremely high reliability during the thermal shock aging test in ambient atmosphere although inferior reliability was observed in vacuum. This phenomenon was investigated and explained by field-emission scanning microscope, energy-dispersive X-ray spectroscopy, and X-ray diffractometer.
机译:在这项研究中,研究了烧结铜接头在SiC功率器件上的热冲击可靠性。首先,使用烧结的铜接头将芯片和由各种材料组成的基板粘结在一起,以评估其粘结性。其次,将SiC虚设芯片接合至DBC基板,并且在环境气氛和真空中都进行从-40℃至250℃的热冲击测试。最后,在25℃至200℃的功率循环测试中评估了通过烧结Cu接头粘结的SiC MOSFET,并通过T3ster设备评估了热导率。结果表明,尽管在真空中观察到较差的可靠性,但在环境气氛下的热冲击老化试验中,烧结的Cu表现出极高的可靠性。通过场发射扫描显微镜,能量色散X射线光谱仪和X射线衍射仪对此现象进行了研究和解释。

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