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Performance enhancement of p-type organic field-effect transistor through introducing organic buffer layers

机译:通过引入有机缓冲层来增强p型有机场效应晶体管的性能

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摘要

Top contact organic field-effect transistors (OFETs) based on pentacene active layer, which employed the organic buffer layers of subphthalocyanine, triphenyl-diamine derivative, and 4,4′,4″-tris[3-methylphenyl(phe-nyl)amino] triphenylamine (m-MTDATA) as the hole injection layers were fabricated. The results showed that the electrical performance of these OFETs, including the saturation current, the field-effect mobility, the on/off current ratio, and the threshold voltage, were all significantly improved by introducing the organic hole injection buffer layers. By optimizing the film thickness of these organic buffer layers to the appropriate thickness, the charge injection from gold source/drain electrodes to pentacene film could be effectively improved. Also, the interfacial properties and the contact resistance between gold source/drain electrodes and pentacene film was analyzed, and the results indicated that the interface property was significantly improved. Moreover, it was found that OFET with m-MTDATA hole injection layer exhibited the best performance compared to other two kinds of materials, and the intrinsic reason was further revealed.
机译:基于并五苯有源层的顶部接触有机场效应晶体管(OFET),该晶体管使用了亚酞菁,三苯基-二胺衍生物和4,4',4''-三[3-甲基苯基(苯甲基)氨基]的有机缓冲层制备作为空穴注入层的三苯胺(m-MTDATA)。结果表明,通过引入有机空穴注入缓冲层,这些OFET的电性能(包括饱和电流,场效应迁移率,开/关电流比和阈值电压)都得到了显着改善。通过将这些有机缓冲层的膜厚度优化为适当的厚度,可以有效地改善从金源/漏电极到并五苯膜的电荷注入。此外,分析了金源/漏电极与并五苯膜之间的界面性质和接触电阻,结果表明界面性质得到了显着改善。此外,发现具有m-MTDATA空穴注入层的OFET与其他两种材料相比表现出最好的性能,并且进一步揭示了内在原因。

著录项

  • 来源
    《Journal of materials science》 |2015年第11期|8301-8306|共6页
  • 作者单位

    State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, University of Electronic Science and Technology of China (UESTC), Chengdu 610054, People's Republic of China;

    State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, University of Electronic Science and Technology of China (UESTC), Chengdu 610054, People's Republic of China;

    State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, University of Electronic Science and Technology of China (UESTC), Chengdu 610054, People's Republic of China;

    State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, University of Electronic Science and Technology of China (UESTC), Chengdu 610054, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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