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首页> 外文期刊>Journal of materials science >Epitaxial growth of (111) BaTiO_3 thin films on (0002) GaN substrates with SrTiO_3/TiN buffer layers
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Epitaxial growth of (111) BaTiO_3 thin films on (0002) GaN substrates with SrTiO_3/TiN buffer layers

机译:在具有SrTiO_3 / TiN缓冲层的(0002)GaN衬底上外延生长(111)BaTiO_3薄膜

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摘要

High-quality perovskite (111) BaTiO3 (BTO) ferroelectric thin films were epitaxially grown on wurtzite (0002) GaN substrates with the rationally designed SrTiO3 (STO)/TiN buffer layers by pulsed laser deposition. Particularly, TiN thin films with excellent conductivity could also be served as the bottom electrodes. The epitaxial relationship of the BTO/STO/TiN/GaN heterostructures was proved to be (111)[1 (1) over bar0] BTO//(111)[1 (1) over bar0] STO//(111)[1 (1) over bar0] TiN//(0002)[11 (2) over bar0] GaN by reflection high-energy electron diffraction and high resolution X-ray diffraction. Furthermore, the detailed interface structure and epitaxial relationship of the BTO/STO/TiN/GaN heterostructures were identified on atomic scale by high resolution transmission electron microscopy. The epitaxial (111) BTO ferroelectric thin films on GaN substrates exhibited the favorable ferroelectric properties with the remnant polarization of 12.97Ccm(-2). The high-quality epitaxial integration of perovskite BTO thin films on wurtzite GaN substrates could promote the potential applications in the advanced GaN-based integrated ferroelectric devices.
机译:通过脉冲激光沉积,在具有合理设计的SrTiO3(STO)/ TiN缓冲层的纤锌矿(0002)GaN衬底上外延生长高质量的钙钛矿(111)BaTiO3(BTO)铁电薄膜。特别地,具有优异导电性的TiN薄膜也可以用作底部电极。 BTO / STO / TiN / GaN异质结构的外延关系被证明是bar0]上的(111)[1(1)] BTO //(111)[bar0]上的STO //(111)[1(1)] (1)通过反射高能电子衍射和高分辨率X射线衍射在bar0]上的TiN //(0002)[11(2)在bar0] GaN上的。此外,通过高分辨率透射电子显微镜在原子尺度上鉴定了BTO / STO / TiN / GaN异质结构的详细界面结构和外延关系。 GaN衬底上的外延(111)BTO​​铁电薄膜表现出良好的铁电特性,剩余极化率为12.97Ccm(-2)。钙钛矿BTO薄膜在纤锌矿型GaN衬底上的高质量外延集成可以促进在先进的基于GaN的集成铁电器件中的潜在应用。

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  • 来源
    《Journal of materials science》 |2019年第10期|9751-9757|共7页
  • 作者单位

    Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, 1295 Dingxi Rd, Shanghai 200050, Peoples R China|Univ Chinese Acad Sci, 19A Yuquan Rd, Beijing 100049, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, 1295 Dingxi Rd, Shanghai 200050, Peoples R China|Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, 19A Yuquan Rd, Beijing 100049, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, 1295 Dingxi Rd, Shanghai 200050, Peoples R China|Univ Chinese Acad Sci, 19A Yuquan Rd, Beijing 100049, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, 1295 Dingxi Rd, Shanghai 200050, Peoples R China|Univ Chinese Acad Sci, 19A Yuquan Rd, Beijing 100049, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, 1295 Dingxi Rd, Shanghai 200050, Peoples R China|Univ Chinese Acad Sci, 19A Yuquan Rd, Beijing 100049, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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