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Structural, Morphological and Optical Properties of ZnO Thin Films Grown on gamma-LiAlO_2 Substrate by Pulsed Laser Deposition

机译:脉冲激光沉积在γ-LiAlO_2衬底上生长的ZnO薄膜的结构,形貌和光学性质

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ZnO thin films were deposited on the substrates of (100) 7-LJAI02 at 400, 550 and 700 deg C using pulsed laser deposition (PLD) with the fixed oxygen pressure of 20 Pa, respectively. When the substrate temperature is 400 deg C, the grain size of the film is less than 1 mu m observed by Leitz microscope and measured by X-ray diffraction (XRD). As the substrate temperature increases to 550 deg C, highly-preferred c-orientation and high-quality ZnO film can be attained. While the substrate temperature rises to 700 deg C, more defects appears on the surface of film and the ZnO films become polycrystalline again possibly because more Li of the substrate diffused into the ZnO film at high substrate temperature. The photoluminescence (PL) spectra of ZnO films at room temperature show the blue emission peaks centered at 430 nm. We suggest that the blue emission corresponds to the electron transition from the level of interstitial Zn to the valence band. Meanwhile, the films grown on 7-L1AI02 (LAO) exhibit green emission centered at 540 nm, which seemed to be ascribed to excess zinc and/or oxygen vacancy in the ZnO films caused by diffusion of Li from the substrates into the films during the deposition.
机译:分别使用固定氧压为20 Pa的脉冲激光沉积(PLD)在400、550和700摄氏度下分别在(100)7-LJAl02的基板上沉积ZnO薄膜。当基板温度为400℃时,通过Leitz显微镜观察并通过X射线衍射(XRD)测量,膜的粒径小于1μm。随着衬底温度升高到550摄氏度,可以获得高度首选的c取向和高质量的ZnO膜。当衬底温度升高到700℃时,更多的缺陷出现在膜的表面上,并且ZnO膜再次变为多晶,这可能是因为在较高的衬底温度下更多的衬底的Li扩散到ZnO膜中。 ZnO薄膜在室温下的光致发光(PL)光谱显示出以430 nm为中心的蓝色发射峰。我们建议蓝色发射对应于从间隙Zn水平到价带的电子跃迁。同时,在7-AlAlO2(LAO)上生长的薄膜表现出以540 nm为中心的绿色发射,这似乎归因于ZnO薄膜中过量的锌和/或氧空位,这是由于Li在溅射过程中从基板扩散到薄膜中引起沉积。

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