机译:PLD在熔融石英衬底上生长的Bi ^ sLai.osTiNbC ^铁电薄膜的非线性光学性质
Institute of Micro-system Physics, Key Laboratory of Photovoltaic Materials of Henan Province and School of Physics & Electronics, Henan University, Kaifeng 475004, People's Republic of China;
Institute of Micro-system Physics, Key Laboratory of Photovoltaic Materials of Henan Province and School of Physics & Electronics, Henan University, Kaifeng 475004, People's Republic of China;
Institute of Micro-system Physics, Key Laboratory of Photovoltaic Materials of Henan Province and School of Physics & Electronics, Henan University, Kaifeng 475004, People's Republic of China;
机译:结构,光学,非线性光学,电介质特性和LA_(0.01)BA_(0.99)TiO_3,SM_(0.5)SR_(0.5)COO_3和SM_(0.5)SR_(0.01)BA_(0.01)BA_的电子结果 (0.99)使用脉冲激光沉积(PLD)技术在石英基板上生长的TiO_3薄膜
机译:PLD在熔融石英衬底上生长的Bi_(2.25)La_(0.75)TiNbO_9薄膜的光学性质
机译:PLD在熔融石英衬底上生长的高度C取向的Bi_3TiNbO_9薄膜的光学特性
机译:石英衬底上Bi3.25La0.75Ti3O12铁电薄膜的超强非线性光学性质
机译:脉冲激光沉积在非线性光波导中生长的铁电氧化物薄膜的合成与性能
机译:退火对溅射生长铋钛氧化物薄膜结构和光学性能的影响
机译:在玻璃基板上生长的高度取向的多晶Bi2WO6薄膜的铁电性质