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Pulsed laser melting of bismuth telluride thermoelectric materials

机译:碲化铋热电材料的脉冲激光熔化

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摘要

While laser melting, deposition, and annealing of semiconductor thin films are well-established, pulsed laser processing of bulk semiconductor material powders has been minimally investigated. This work investigates nanosecond pulsed laser melting of bismuth telluride, a common thermoelectric material. Using both experimental and computational modeling methods, a process window was determined in which melting is achieved before ablation occurs. The process window was determined for Bi2Te3 powder compacts, with melt depths on the order of 20-100 mu m. The melted region had a fine-grained, columnar microstructure and showed typical selective laser melting defects such as microcracking. Stroboscopic imaging was used as an in situ imaging technique to observe molten pool features, revealing a teardrop-shaped molten pool with little resolidification between pulses. A simplified thermal model of the nanosecond pulsed laser melting process was developed, and two models for the solid phase thermal conductivity were used to investigate the impact of thermal conductivity on the size, shape, and duration of the molten pool. The results demonstrate the narrow process window available for pulsed laser processing of bulk bismuth telluride powders, and the discussion includes thermal management approaches possible for reducing defects such as microcracking.
机译:虽然已经很好地确定了半导体薄膜的激光熔化,沉积和退火工艺,但对体半导体材料粉末的脉冲激光加工已进行了最少的研究。这项工作研究了碲化铋(一种常见的热电材料)的纳秒脉冲激光熔化。使用实验和计算建模方法,确定了一个工艺窗口,在该工艺窗口中,在消融发生之前已实现熔化。确定了Bi2Te3粉末压块的工艺窗口,其熔体深度为20-100微米。熔化的区域具有细小的柱状微观结构,并显示出典型的选择性激光熔化缺陷,例如微裂纹。频闪成像被用作原位成像技术来观察熔池特征,揭示了泪滴状熔池,脉冲之间几乎没有再凝固。建立了纳秒脉冲激光熔化过程的简化热模型,并使用两个固相热导模型来研究热导对熔池大小,形状和持续时间的影响。结果表明,窄体积的碲化铋粉末的脉冲激光处理可利用的处理窗口较窄,并且该讨论包括可减少缺陷(如微裂纹)的热管理方法。

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