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Photoluminescence characterization of polycrystalline n-type Cu2O films

机译:多晶n型Cu2O薄膜的光致发光特性

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Electrodeposition was used to deposit Cu2O thin films on ITO substrates. Photoresponse of the film clearly indicated n-type behavior of Cu2O in photoelectrochemical cells. The temperature dependence of photoluminescence (PL) revealed that the spectra consist of donor-acceptor pair emissions and the recombination between electrons bound to donors and free holes. We observed that the dominant intrinsic defect, oxygen vacancies, creates a donor energy level at 0.38 eV below the bottom of the conduction band. As a result, this donor level acts as a center for both PL emissions and to produce n-type conductivity in the electrodeposited Cu2O films. In addition, an acceptor energy level at 0.16eV from the top of the valence band was observed. (c) 2005 Elsevier B.V. All rights reserved.
机译:电沉积用于在ITO基板上沉积Cu2O薄膜。膜的光响应清楚地表明了光电化学电池中Cu2O的n型行为。光致发光(PL)的温度依赖性表明,光谱由施主-受主对发射以及结合到施主和自由空穴的电子之间的重组组成。我们观察到,主要的固有缺陷氧空位在导带底部以下0.38 eV处产生了供体能级。结果,该供体能级既充当PL排放的中心,又在电沉积的Cu2O膜中产生n型电导率。另外,从价带的顶部观察到0.16eV的受体能级。 (c)2005 Elsevier B.V.保留所有权利。

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