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首页> 外文期刊>Journal of Electronic Materials >Process Modeling and Simulation for Hg_(1-x)Cd_xTe. Part Ⅰ: Status of Stanford University Mercury Cadmium Telluride Process Simulator
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Process Modeling and Simulation for Hg_(1-x)Cd_xTe. Part Ⅰ: Status of Stanford University Mercury Cadmium Telluride Process Simulator

机译:Hg_(1-x)Cd_xTe的过程建模和仿真。第一部分:斯坦福大学汞碲化镉工艺模拟器的现状

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摘要

Details are provided concerning the basic point defect parameter set of the Stanford University mercury cadmium telluride process simulator (SUMerCad). The Hg interstitial and vacancy parameters are presented and justified for x = 0.2 material. In particular, values for the thermodynamic limits, diffusion coefficients, recombination rates, generation rates, and boundary conditions are specified and their determination methodology is reviewed. The parameters have been determined for overall consistency with a specific pool of experimental results which include studies of Hg self-diffusion, type-conversion, and the existence region. Our presentation will review the current state of the Hg_(1-x)Cd_xTe modeling effort, and outline the future direction of the simulator, providing examples and discussion. Finally, some issues related to the future development of SUMerCad are discussed, including electric field effects, general boundary conditions, alternative junction formation processes, extended defects, and interdiffusion.
机译:提供了有关斯坦福大学碲化汞镉工艺模拟器(SUMerCad)的基本点缺陷参数集的详细信息。提出了汞的间隙和空位参数,并针对x = 0.2的材料进行了证明。特别是,指定了热力学极限,扩散系数,复合率,生成率和边界条件的值,并对它们的确定方法进行了审查。确定了与总体实验结果一致的参数,包括一系列的Hg自扩散,类型转换和存在区域研究。我们的演示文稿将回顾Hg_(1-x)Cd_xTe建模工作的当前状态,并概述模拟器的未来方向,并提供示例和讨论。最后,讨论了与SUMerCad的未来发展有关的一些问题,包括电场效应,一般边界条件,替代结形成过程,扩展缺陷和相互扩散。

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