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Process of Preparing a p-n Junction in Semi-Conductor Alloys of Mercury Telluride and Cadmium Telluride

机译:在碲化汞和碲化镉半导体合金中制备p-n结的方法

摘要

1,191,171. Semi-conductor devices. CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE. 26 May, 1967 [27 May, 1966], No. 24711/67. Heading H1K. A method of producing a PN junction in a body of semi-conductor material having the composition Hg 1-x Cd x Te, 0#x#0À4, comprises subjecting a monocrystalline body to a number of thermal treatments of durations t, at temperatures T in the presence of mercury vapour at pressures P, wherein for the first treatment t 1 increases as a function of the thickness of the body, T 1 350‹ C., and P 1 is from 6 Î 10SP-3/SP to 1À5 Î 10SP-2/SP atmospheres, to produce an N-type body having a low concentration of charge carriers and then either (i) performing a second treatment in which t 2 is from 1 to 30 min., T 2 300‹ C. and P 2 is from 0À2 to 1 atmosphere to produce a P-type body having a high concentration of charge carriers, followed by a third treatment in which t 3 is from 1 to 3 hours, T 3 is from 300‹ to 500‹ C. and is less than or equal to T 2 , and P 3 equals the equilibrium pressure of mercury vapour at the temperature T 3 , to produce an N-type surface layer on the body; or (ii) omitting the second treatment and performing the third treatment only as in (i) to convert the body to P-type while maintaining a surface layer of N-type conductivity. The body may then be cut to the required size and the surface treated first in a solution containing fuming hydrochloric acid, nitric acid and a trace of fuming nitric acid, followed by rinsing by diluting the solution with absolute ethyl alcohol and then using a solution comprising a mixture of absolute ethyl alcohol and bromine, followed by a second rinsing. Contacts are provided by electrolytically depositing layers of gold on the P- and N-type regions and welding indium or indium-silver to the layers to produce a photo-voltaic device. The electrodes on either region may also be of platinum, and that on the N-type region may additionally be of indium or of gallium-indium or mercury-indium eutectics. The electrodes may also be produced by evaporation. The device may be utilized in photo-conductive, photomagneto-electric, and photovoltaic detectors, for light emissive and laser devices, and for modulators and amplifiers using piezoabsorption, piezo-reflectivity, photo-absorption, photo-reflectivity or the Franz-Keldysh effect (i.e. variation of the activation energy #E by the application of an intense electric field).
机译:1,191,171。半导体器件。国家教育中心科学中心。 1967年5月26日[1966年5月27日],第24711/67号。标题H1K。一种在组成为Hg 1-x Cd x Te,0#x#0-4的半导体材料体中制造PN结的方法,该方法包括在温度T下对单晶进行持续时间t的多次热处理在压力为P的汞蒸气存在下,其中对于第一种治疗,t 1随着身体厚度的变化而增加,T 1 <350 ‹C,并且P 1为6Î10 -3 < / SP>到1‑5Î10 -2 大气,以产生电荷载流子浓度低的N型物体,然后(i)进行第二次处理,其中t 2为1至30分钟后,T 2> 300 ‹C,并且P 2为0‑2至1大气,以生产具有高浓度载流子的P型体,然后进行第三次处理,其中t 3为1至3小时,T 3为300℃至500℃,并且小于或等于T 2,并且P 3等于温度T 3时汞蒸气的平衡压力,从而在人体上产生N型表面层;或者(ii)仅在(i)中省略第二处理而仅执行第三处理,以在保持N型导电性的表面层的同时将主体转变为P型。然后可以将物体切成所需的尺寸,并首先在含有发烟盐酸,硝酸和微量发烟硝酸的溶液中进行表面处理,然后通过用无水乙醇稀释该溶液进行漂洗,然后使用无水乙醇和溴的混合物,然后进行第二次冲洗。通过在P型和N型区域上电解沉积金层并将铟或铟银焊接到这些层上以产生光伏器件来提供接触。在任一区域上的电极也可以是铂的,而在N型区域上的电极可以另外是铟的或镓-铟或汞-铟的低共熔物。电极也可以通过蒸发产生。该设备可用于光电,光电和光电检测器,发光和激光设备,以及使用压电吸收,压电反射,光吸收,光反射或弗朗兹-凯尔迪什效应的调制器和放大器(即,通过施加强电场使活化能#E发生变化)。

著录项

  • 公开/公告号GB1191171A

    专利类型

  • 公开/公告日1970-05-06

    原文格式PDF

  • 申请/专利权人 CENTRE NATIONAL DE LA RECHURCHE SCIENTIFIQUE;

    申请/专利号GB19670024711

  • 发明设计人

    申请日1967-05-26

  • 分类号H01L21/383;H01L21/477;H01L31/00;H01L31/0296;

  • 国家 GB

  • 入库时间 2022-08-23 10:32:41

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