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Growth of Thick Epitaxial CdTe Films by Close Space Sublimation

机译:近空间升华法生长厚外延CdTe薄膜

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This paper reports on a detailed study of the development of the close space sublimation method, which has been widely used in the preparation of polycrystalline CdTe/CdS solar cells, as an epitaxial method for the growth of thick CdTe single crystal films over 200 μm on GaAs and Ge substrates for high-energy radiation detectors. The resulting microscopic growth phenomena in the process are also discussed in this paper. High-quality single crystalline CdTe thick films were prepared with x-ray rocking curves full width at half maximum (FWHM) values, which were ∼100 arcsec on Ge substrates and 300 arcsec on GaAs substrates. The quality of thick films on Ge(100) showed a substantial improvement with nucleation in a Te-rich growth environment. No Te inclusions in the CdTe films grown on GaAs(211)B and Ge(100) were observed with IR transmission imaging. Photoluminescence of CdTe/Ge shows a large reduction in the 1.44 eV defect energy bands compared with films grown on GaAs substrates. The film resistivity is on the order of 1010 Ω cm, and the film displayed some sensitivity to alpha particles.
机译:本文报道了近距离升华方法的发展的详细研究,该方法已广泛用于制备多晶CdTe / CdS太阳能电池,作为外延法在200μm以上的厚度上生长厚CdTe单晶膜。用于高能辐射探测器的GaAs和Ge衬底。本文还讨论了由此产生的微观生长现象。制备了高质量的单晶CdTe厚膜,其X射线摇摆曲线的半峰全宽(FWHM)值在Ge衬底上约为100弧秒,在GaAs衬底上约为300弧秒。在富Te生长的环境中,Ge(100)上厚膜的质量显示出明显的成核作用。通过红外透射成像未观察到在GaAs(211)B和Ge(100)上生长的CdTe膜中没有Te夹杂物。与在GaAs衬底上生长的薄膜相比,CdTe / Ge的光致发光显示1.44 eV缺陷能带大大降低。膜的电阻率约为10 10 Ωcm,并且膜对α粒子显示出一定的灵敏度。

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