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首页> 外文期刊>Journal of Electronic Materials >Growth of Thick Epitaxial CdTe Films by Close Space Sublimation
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Growth of Thick Epitaxial CdTe Films by Close Space Sublimation

机译:近距离升华法生长厚外延CdTe薄膜

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This paper reports on a detailed study of the development of the close space sublimation method, which has been widely used in the preparation of poly-crystalline CdTe/CdS solar cells, as an epitaxial method for the growth of thick CdTe single crystal films over 200 (mu)m on GaAs and Ge substrates for high-energy radiation detectors. The resulting microscopic growth phenomena in the process are also discussed in this paper. High-quality single crystalline CdTe thick films were prepared with x-ray rocking curves full width at half maximum (FWHM) values, which were approx100 arcsec on Ge substrates and 300 arcsec on GaAs substrates. The quality of thick films on Ge(100) showed a substantial improvement with nucleation in a Te-rich growth environment. No Te inclusions in the CdTe films grown on GaAs(211)B and Ge(100) were observed with IR transmission imaging. Photoluminescence of CdTe/Ge shows a large reduction in the 1.44 eV defect energy bands compared with films grown on GaAs substrates. The film resistivity is on the order of 10~(10) OMEGA cm, and the film displayed some sensitivity to alpha particles.
机译:本文报道了近距离升华方法的发展的详细研究,该方法已广泛用于制备多晶CdTe / CdS太阳能电池,作为外延生长200埃以上厚CdTe单晶膜的方法。用于高能辐射探测器的GaAs和Ge基板上的微米厚度。本文还讨论了由此产生的微观生长现象。制备了高质量的单晶CdTe厚膜,其X射线摇摆曲线的半峰全宽(FWHM)值在Ge衬底上约为100弧秒,在GaAs衬底上约为300弧秒。在富Te的生长环境中,Ge(100)上厚膜的质量随着成核作用而显示出显着改善。用红外透射成像未观察到在GaAs(211)B和Ge(100)上生长的CdTe薄膜中有Te夹杂物。与在GaAs衬底上生长的薄膜相比,CdTe / Ge的光致发光显示1.44 eV缺陷能带大大降低。薄膜的电阻率约为10到(10)OMEGA cm,并且薄膜对α粒子表现出一定的敏感性。

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