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Growth of Cd_(1-x)Zn_xTe epitaxial layers by isothermal closed space sublimation

机译:等温封闭空间升华法生长Cd_(1-x)Zn_xTe外延层

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The growth and structural characterization of Cd_1-xZn_xTe epitaxial films on (100) GaAs substrates is reported. The samples were obtained by a novel isothermal closed space sublimation technique, which was previously used for The growth of ZnTe in atomic layer epitaxy regime. For growing the films, a GaAs substrate is exposed alternately to the Elemental sources (Cd, Zn, Te) at isothermal condition employing a closed space geometry. Eleven different ZnTe: CdTe Cycle combinations were done to obtain different Zn compositions. The Zn molar fractions were measured by X-ray and Transmission electron diffraction patterns that also revealed the epitaxial quality of the films. Influence of the growth Parameters on the composition and the thickness of the films is discussed.
机译:报道了(100)GaAs衬底上Cd_1-xZn_xTe外延膜的生长和结构表征。通过新颖的等温封闭空间升华技术获得了样品,该技术先前已用于原子层外延中ZnTe的生长。为了生长膜,GaAs基板在等温条件下采用封闭空间几何形状交替暴露于元素源(Cd,Zn,Te)。进行了11种不同的ZnTe:CdTe循环组合以获得不同的Zn组成。通过X射线和透射电子衍射图测量Zn的摩尔分数,这也揭示了膜的外延质量。讨论了生长参数对薄膜组成和厚度的影响。

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