首页> 外文期刊>Journal of Crystal Growth >Preparation and structural analysis of Fe_(2+x)Ti_(1-x) thin films in the C14 Laves phase stability range
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Preparation and structural analysis of Fe_(2+x)Ti_(1-x) thin films in the C14 Laves phase stability range

机译:C14 Laves相稳定范围内Fe_(2 + x)Ti_(1-x)薄膜的制备和结构分析

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We report the epitaxial growth of single phase (001)-oriented thin films of Fe_(2+x)Ti_(1-x) in the C14 Laves phase stability range using molecular beam epitaxy (MBE). The growth was studied by reflection high-energy electron diffraction (RHEED) and X-ray diffraction (XRD). The onset temperature for epitaxial growth and the temperature range for improved crystalline coherence were identified. From X-ray reflectometry analysis the rms roughness was estimated to 0.5 nm for typical film thicknesses of 22 nm. As revealed by scanning tunneling microscopy (STM), this roughness is discrete and due to step edges corresponding to the full c-axis length of Fe_2Ti. The epitaxial growth implies an extended range of homogeneity as compared to bulk samples. A strong dependence of the growth behavior on the composition within the range of homogeneity was observed exhibiting increased crystalline coherence at higher iron concentrations. Furthermore, the volume increase of the unit cell with the Ti concentration is compatible to Vegard's law. Evidence for an iron-induced surface reconstruction was found in RHEED investigations.
机译:我们报告使用分子束外延(MBE)在C14 Laves相稳定范围内的Fe_(2 + x)Ti_(1-x)单相(001)取向薄膜的外延生长。通过反射高能电子衍射(RHEED)和X射线衍射(XRD)研究了生长。确定了用于外延生长的起始温度和用于改善晶体相干性的温度范围。根据X射线反射仪分析,对于典型的22 nm膜厚,均方根粗糙度估计为0.5 nm。如通过扫描隧道显微镜(STM)揭示的,该粗糙度是离散的,并且是由于台阶边缘对应于Fe_2Ti的整个c轴长度。与大量样品相比,外延生长意味着均匀性的扩展范围。在均匀性范围内观察到生长行为对组合物的强烈依赖性,在较高铁浓度下表现出增加的晶体相干性。此外,随着Ti浓度的增加,晶胞的体积增加符合维加德定律。在RHEED研究中发现了铁诱导的表面重建的证据。

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