首页> 外文期刊>Journal of Crystal Growth >Optical response at 1.3 um and 1.5μm with InAs quantum dots embedded in a pure GaAs matrix
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Optical response at 1.3 um and 1.5μm with InAs quantum dots embedded in a pure GaAs matrix

机译:在纯GaAs矩阵中嵌入InAs量子点时在1.3 um和1.5μm处的光学响应

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摘要

We demonstrated that the growth of InAs on GaAs at rates as low as 0.003 ML/s can be used to form quantum dots (QDs) that are optically active at 1.3 and 1.5μm. The emission at 1.5μm (at 300K) originating from individual InAs QDs embedded in a pure GaAs matrix is close to the important telecom window at 1.55μm. Such emission is related to a narrow distribution of islands with a height peaked around 15nm as shown by atomic-force microscopy.
机译:我们证明了InAs在GaAs上以低至0.003 ML / s的速率生长可用于形成在1.3和1.5μm处具有光学活性的量子点(QD)。来自嵌入在纯GaAs矩阵中的各个InAs QD的1.5μm(300K)发射接近于重要的电信窗口1.55μm。如原子力显微镜所示,这种发射与岛的狭窄分布有关,岛的高度峰值约为15nm。

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