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Study of different type of dislocations in GaN thin films

机译:GaN薄膜中不同类型位错的研究

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High-resolution X-ray diffraction was used to analyze the type of dislocations in GaN epitaxial thin films. Rocking curves of five planes were investigated, (0 0 0 2), (1 0 (1) over bar 3), (1 0 (1) over bar 2), (1 0 (1) over bar 1), and (2 0 (2) over bar 1), respectively. Pseudo-Voigt function was used to simulate the rocking-curve of every plane. Every extension of the rocking-curve was regarded as the effect of the interaction of the twist and tilt fractions of the dislocations. From the result, it is found that carrier mobility is more sensitive to substrate normal tilt dislocation than to in-plane twist and the interaction of the twist and tilt fractions also affect the carrier mobility. (C) 2004 Elsevier B.V. All rights reserved.
机译:高分辨率X射线衍射用于分析GaN外延薄膜中的位错类型。研究了五个平面的摇摆曲线,(0 0 0 2),(条3上的1 0(1)),(条2上的1 0(1)),(条1上的1 0(1)),和(条1)上的2 0(2)。伪Voigt函数用于模拟每个平面的摇摆曲线。摇摆曲线的每个延伸都被认为是位错的扭曲和倾斜部分相互作用的影响。从该结果发现,载流子迁移率对衬底正常倾斜位错比对平面内扭曲更敏感,并且扭曲和倾斜部分的相互作用也影响载流子迁移率。 (C)2004 Elsevier B.V.保留所有权利。

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