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首页> 外文期刊>Journal of Crystal Growth >In situ study of low-temperature growth and Mn, Si, Sn doping of GaAs (001) in molecular beam epitaxy
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In situ study of low-temperature growth and Mn, Si, Sn doping of GaAs (001) in molecular beam epitaxy

机译:GaAs(001)分子束外延中的低温生长及Mn,Si,Sn掺杂的原位研究

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摘要

Low-temperature growth of GaAs was investigated using in situ reflectance anisotropy spectroscopy (RAS) for the first time. RAS indicates that the surface during growth is mostly unreconstructed with many dangling bonds. Above a critical thickness anisotropic roughening occurs. When doped with Mn, Si, and Sn the RAS signal showed only contributions due to surface band bending from doping. At very high concentrations the spectra change, indicating a transition from doping to alloying. Alloying occurred above 2-3% Mn or for more than 1% Sn incorporation.
机译:首次使用原位反射各向异性光谱(RAS)研究了GaAs的低温生长。 RAS表示生长期间的表面大部分没有被悬空的键重建。超过临界厚度,会发生各向异性粗糙化。当掺杂有Mn,Si和Sn时,RAS信号仅显示出由于掺杂引起的表面带弯曲而产生的贡献。在非常高的浓度下,光谱发生变化,表明从掺杂过渡到合金化。 Mn含量超过2-3%或掺入Sn含量超过1%时会发生合金化。

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