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首页> 外文期刊>Journal of Crystal Growth >Valence electron structure analysis of epitaxial growth of diamond (100) film on Si and c-BN substrate
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Valence electron structure analysis of epitaxial growth of diamond (100) film on Si and c-BN substrate

机译:Si和c-BN衬底上金刚石(100)膜外延生长的价电子结构分析

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摘要

Based on the Pauling's nature of chemical bond, the valence electron structures of diamond. Si and c-BN crystals have been constructed and the relative electron density difference (REDD) between the diamond (1 0 0) plane and 22 planes in Si and c-BN substrate, respectively, have been calculated. The experimental results, that the diamond (1 0 0) film can exclusively grow directly on the (1 0 0) oriented c-BN substrate, have been explained satisfactorily from minimization of the electron density difference across the interface. (c) 2006 Elsevier B.V. All rights reserved.
机译:根据鲍林化学键的性质,可以得出金刚石的价电子结构。已经构建了Si和c-BN晶体,并且分别计算了Si和c-BN衬底中金刚石(1 0 0)平面和22个平面之间的相对电子密度差(REDD)。通过使界面上的电子密度差最小化,可以令人满意地说明金刚石(1 0 0)膜只能在(1 0 0)取向的c-BN衬底上直接直接生长的实验结果。 (c)2006 Elsevier B.V.保留所有权利。

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