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Growth and structural properties of thick GaN layers obtained by sublimation sandwich method

机译:通过升华夹心法获得的厚GaN层的生长和结构特性

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摘要

The synthesis and characterization of GaN thick layers are reported in this paper. The layers were prepared by sublimation sandwich method (SSM). Powder of GaN was used as the source of gallium and ammonia was used as the source of nitrogen. Sapphire with 3 μm GaN thin film grown by MOCVD was used as the substrate. The GaN layers having a current maximum size of 200 μm thickness and 10 mm x 10 mm area were obtained. It is also shown that the crystals of best crystalline quality are obtained with a growth rate of 20 μm/ h. Characterization of the layers was performed using rocking curve, maps of reflection, structure refinement and SIMS. Quality of the material is good.
机译:本文报道了GaN厚层的合成与表征。通过升华夹心法(SSM)制备各层。 GaN粉末用作镓的来源,氨用作氮的来源。将具有通过MOCVD生长的3μmGaN薄膜的蓝宝石用作衬底。获得具有200μm厚度的当前最大尺寸和10mm×10mm面积的GaN层。还显示出以20μm/ h的生长速率获得了最佳晶体质量的晶体。使用摇摆曲线,反射图,结构细化和SIMS对层进行表征。材料质量好。

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