首页> 外文期刊>Journal of Crystal Growth >Room temperature ferromagnetism of GaN:Mn thin films grown by low pressure metal-organic chemical vapor deposition by mn periodic delta-doping
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Room temperature ferromagnetism of GaN:Mn thin films grown by low pressure metal-organic chemical vapor deposition by mn periodic delta-doping

机译:mn周期性δ掺杂低压金属有机化学气相沉积法生长的GaN:Mn薄膜的室温铁磁性

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摘要

Epitaxial films of GaN:Mn have been grown on c-sapphire substrates by low pressure metal-organic chemical vapor deposition (LP-MOCVD) by Mn periodic delta-doping. The samples showed ferromagnetic behavior at room temperature with hysteresis curves showing a coercivity of 170 Oe. No ferromagnetic second phases and no significant deterioration in crystal quality with the incorporation of Mn were detected by high-resolution X-ray diffraction (XRD). The Mn'concentrations of the layers were determined to be 0.227% by proton induced X-ray emission (PIXE).
机译:GaN:Mn的外延膜已通过Mn周期性δ掺杂通过低压金属有机化学气相沉积(LP-MOCVD)在c-蓝宝石衬底上生长。样品在室温下表现出铁磁行为,磁滞曲线表明矫顽力为170 Oe。通过高分辨率X射线衍射(XRD)未检测到铁磁第二相,也未检测到由于掺入Mn而导致的晶体质量显着下降。通过质子诱导的X射线发射(PIXE)确定各层的Mn'浓度为0.227%。

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