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Epitaxial oxide thin films grown by solid source metal-organic chemical vapor deposition.

机译:通过固体源金属有机化学气相沉积法生长的外延氧化物薄膜。

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摘要

The conventional liquid source metal-organic chemical vapor deposition (MOCVD) technique is capable of producing large area, high quality, single crystal semiconductor films. However, the growth of complex oxide films by this method has been hampered by a lack of suitable source materials. While chemists have been actively searching for new source materials, the research work reported here has demonstrated the successful application of solid metal-organic sources (based on tetramethylheptanedionate) to the growth of high quality thin films of binary compound cerium dioxide (CeO{dollar}sb2{dollar}), and two more complex materials, the ternary compound lithium niobate (LiNbO{dollar}sb3{dollar}), with two cations, and the quaternary compound strontium barium niobate (SBN), with three cations.; The growth of CeO{dollar}sb2{dollar} thin films on (1012)Al{dollar}sb2{dollar}O{dollar}sb3{dollar} substrates has been used as a model to study the general growth behavior of oxides. Factors affecting deposition rate, surface morphology, out-of-plane mosaic structure, and film orientation have been carefully investigated. A kinetic model based on gas phase prereaction is proposed to account for the substrate temperature dependence of film orientation found in this system. Atomically smooth, single crystal quality cerium dioxide thin films have been obtained. Superconducting YBCO films sputtered on top of solid source MOCVD grown thin cerium dioxide buffer layers on sapphire have been shown to have physical properties as good as those of YBCO films grown on single crystal MgO substrates.; The thin film growth of LiNbO{dollar}sb3{dollar} and Sr{dollar}sb{lcub}1-x{rcub}{dollar}Ba{dollar}sb{lcub}x{rcub}{dollar}Nb{dollar}sb2{dollar}O{dollar}sb6{dollar} (SBN) was more complex and challenging. Phase purity, transparency, in-plane orientation, and the ferroelectric polarity of LiNbO{dollar}sb3{dollar} films grown on sapphire substrates was investigated. The first optical quality, MOCVD grown LiNbO{dollar}sb3{dollar} films, having waveguiding losses of less than 2 dB/cm, were prepared. An important aspect of the SBN film growth studies involved finding a suitable single crystal substrate material. MgO (100) was found to be a useful substrate material for growing (001)-oriented SBN films. However, four in-plane grain orientations coexisted under certain conditions. The volume fraction of the mixed grains was dependent on source composition and not by deposition rate, substrate temperature, cooling rate, or deposition method. The single phase existence region for SBN films was found to deviate from that in the equilibrium phase diagram. Near optical quality films were obtained.; The results found in this study on three quite different oxide materials indicate that solid source MOCVD can provide excellent film quality, exceeding or competitive with physical vapor deposition techniques.
机译:常规的液源金属有机化学气相沉积(MOCVD)技术能够生产大面积,高质量的单晶半导体膜。然而,由于缺乏合适的源材料,阻碍了通过该方法的复合氧化物膜的生长。虽然化学家一直在积极寻找新的原材料,但此处报道的研究工作表明,固体金属有机材料(基于四甲基庚二酸二乙酯)已成功应用于二元复合二氧化铈(CeO {dollar} sb2 {dollar})和两种更复杂的材料,即带有两个阳离子的三元复合铌酸锂(LiNbO {dollar} sb3 {dollar})和带有三个阳离子的四元复合铌酸锶锶(SBN)。在(1012)Al {dollar} sb2 {dollar} O {dollar} sb3 {dollar}衬底上生长CeO {dollar} sb2 {dollar}薄膜已被用作研究氧化物一般生长行为的模型。已经仔细研究了影响沉积速率,表面形态,面外镶嵌结构和膜取向的因素。提出了一种基于气相预反应的动力学模型,以说明该系统中发现的薄膜取向对衬底温度的依赖性。已经获得原子光滑,单晶品质的二氧化铈薄膜。已经证明,溅射在蓝宝石上的固体源MOCVD生长的二氧化铈薄缓冲层上的超导YBCO膜具有与在单晶MgO衬底上生长的YBCO膜一样好的物理性能。 LiNbO {dollar} sb3 {dollar}和Sr {dollar} sb {lcub} 1-x {rcub} {dollar} Ba {dollar} sb {lcub} x {rcub} {dollar} Nb {dollar}的薄膜生长sb2 {dollar} O {dollar} sb6 {dollar}(SBN)更加复杂且具有挑战性。研究了在蓝宝石衬底上生长的LiNbO {s}} {sb3 {s}}薄膜的相纯度,透明度,面内取向和铁电极性。制备了第一光学质量,MOCVD生长的LiNbO {sb3 {dollar}}薄膜,其波导损耗小于2 dB / cm。 SBN薄膜生长研究的重要方面涉及找到合适的单晶衬底材料。发现MgO(100)是用于生长(001)取向SBN膜的有用基材。但是,在一定条件下共存在四个面内晶粒取向。混合颗粒的体积分数取决于源组成,而不取决于沉积速率,基板温度,冷却速率或沉积方法。发现SBN膜的单相存在区域偏离平衡相图中的区域。获得接近光学质量的膜。在这项针对三种完全不同的氧化物材料的研究中发现的结果表明,固体源MOCVD可以提供出色的薄膜质量,超过或优于物理气相沉积技术。

著录项

  • 作者

    Lu, Zihong.;

  • 作者单位

    Stanford University.;

  • 授予单位 Stanford University.;
  • 学科 Engineering Materials Science.; Engineering Electronics and Electrical.; Physics Condensed Matter.
  • 学位 Ph.D.
  • 年度 1995
  • 页码 214 p.
  • 总页数 214
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;无线电电子学、电信技术;
  • 关键词

  • 入库时间 2022-08-17 11:49:38

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