机译:射频功率对室温下沉积在石墨上的氮化硼薄膜相变的依赖性
State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, China;
State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, China;
State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, China;
State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, China;
State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, China;
State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, China;
State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, China;
State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, China;
State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, China;
A1. Crystal structure; A3. Physical vapor deposition processes; B1. Nitrides; B2. Semiconducting Ⅲ-V materials;
机译:通过反射高能电子衍射(RHEED),原子力显微镜(AFM)和扫描隧道显微镜(STM)对化学气相沉积的金刚石薄膜,立方氮化硼和石墨进行表面研究
机译:高温高压下热解硼氮化物的高阶石墨状相变
机译:等离子体增强原子层沉积法沉积的氮化钽薄膜的高温相变,用于栅电极应用
机译:低温化学气相沉积法沉积碳氮化硼薄膜的表征
机译:硼氮化硼薄膜沉积在RF磁控溅射
机译:射频磁控反应共溅射沉积CaO–CoO薄膜的两相转变法生长CaxCoO2薄膜
机译:表面增强的拉曼散射4-氨噻吩吸附在沉积在立方硼氮化物膜上的银纳米蛋白酶上