首页> 外文期刊>Journal of Crystal Growth >Power scalable 2.5 urn (AlGaIn)(AsSb) semiconductor disk laser grown by molecular beam epitaxy
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Power scalable 2.5 urn (AlGaIn)(AsSb) semiconductor disk laser grown by molecular beam epitaxy

机译:通过分子束外延生长的功率可扩展的2.5微米(AlGaIn)(AsSb)半导体磁盘激光器

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摘要

We demonstrate first GaSb-based semiconductor disk laser (SDL) emitting 0.6 W of output power at 2.5 μm. A gain structure comprising 15 strained In_(0.35)Ga_(0.65)As_(0.09)Sb_(0.91) quantum wells sandwiched between Al_(0.35)Ga_(0.65)As_(0.035)Sb_(0.965) barriers was grown by molecular beam epitaxy on (1 0 0) n-doped GaSb substrate. SDL demonstrates promising potential for power scaling and wavelength tuning.
机译:我们演示了第一个基于GaSb的半导体磁盘激光器(SDL),其在2.5μm的波长下可发出0.6 W的输出功率。通过分子束外延生长在15个In_(0.35)Ga_(0.65)As_(0.09)Sb_(0.91)量子阱之间夹在Al_(0.35)Ga_(0.65)As_(0.035)Sb_(0.965)势垒之间的增益结构。 (1 0 0)n掺杂的GaSb衬底。 SDL展示了在功率缩放和波长调谐方面有希望的潜力。

著录项

  • 来源
    《Journal of Crystal Growth》 |2011年第1期|p.454-456|共3页
  • 作者单位

    Optoelectronics Research Centre, Tampere University of Technology, P.O. Box 692, FIN-33101 Tampere, Finland;

    Optoelectronics Research Centre, Tampere University of Technology, P.O. Box 692, FIN-33101 Tampere, Finland;

    Optoelectronics Research Centre, Tampere University of Technology, P.O. Box 692, FIN-33101 Tampere, Finland;

    Optoelectronics Research Centre, Tampere University of Technology, P.O. Box 692, FIN-33101 Tampere, Finland;

    Optoelectronics Research Centre, Tampere University of Technology, P.O. Box 692, FIN-33101 Tampere, Finland;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A3. Molecular beam epitaxy; B1. Antimonides; B2. Semiconducting III-V materials; B3. Infrared devices;

    机译:A3。分子束外延;B1。锑;B2。半导体III-V材料;B3。红外线设备;

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