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首页> 外文期刊>Journal of Crystal Growth >Step bunching in InGaAs/GaAs quantum wells grown by molecular beam epitaxy on GaAs (001) vicinal surfaces
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Step bunching in InGaAs/GaAs quantum wells grown by molecular beam epitaxy on GaAs (001) vicinal surfaces

机译:在GaAs(001)邻近表面上通过分子束外延生长的InGaAs / GaAs量子阱中的台阶聚集

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摘要

In the present work, we investigated the influence of step bunching on the optical properties of IngaAs/GaAs quantum wells (QWs) grown by molecular beam epitaxy (MBE) on vicinal surfaces. Photoluminescence (PL) measurements showed a larger full width at half maximum (FWHM) of the emission coming from the QWs grown on the vicinal surfaces with respect to the nominal sample. Transmission-electron-microscopy (TEM) measurements revealed the presence of step bunches that clearly roughen the interfaces of the heterostructures and worsen the optical properties of the samples.
机译:在当前的工作中,我们研究了分子束外延(MBE)在邻近表面上生长的IngaAs / GaAs量子阱(QWs)的光学成束效应。光致发光(PL)测量显示,相对于标称样品,来自在邻近表面上生长的QW的发射的半峰全宽(FWHM)更大。透射电子显微镜(TEM)测量揭示了台阶束的存在,这些台阶束明显使异质结构的界面变粗糙,并降低了样品的光学性能。

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