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Size control of InAs quantum dots on 2 -off GaAs (100) substrate by the thickness of GaAs buffer layer

机译:通过GaAs缓冲层的厚度控制2-off GaAs(100)衬底上InAs量子点的尺寸

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We have investigated the dependence of the size distributions of InAs quantum dots grown on 2 -off (100) GaAs substrate on the thickness of the GaAs buffer layers were transformed from 7 to 70 ML, the terrace widths were transformed from 25 to thicknesses of GaAs buffer layers were transformed from 7 to 70 ML, the terrace widths were transformed from 25 to 75 nm by bunching effects of Ga adatoms. It was concluded that not only the thickness of GaAs buffer layer but also the AsH_3 partial pressure affected much on the terrace width by which the size of InAs quantum dots was successfully Manipulated. The wire-like QDs could also be fabricated by using the size control of the InAs QDs.
机译:我们已经研究了在2-off(100)GaAs衬底上生长的InAs量子点的尺寸分布对GaAs缓冲层厚度从7 ML转变为70 ML,平台宽度从25改变为GaAs厚度的依赖性通过Ga吸附原子的聚束作用,将缓冲层从7 ML转变为70 ML,平台宽度从25 nm转变为75 nm。结论是,不仅GaAs缓冲层的厚度而且AsH_3分压对平台宽度影响很大,由此成功地控制了InAs量子点的尺寸。线状QD也可以通过使用InAs QD的尺寸控制来制造。

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