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Radiation performance of planar junctionless devices and junctionless SRAMs

机译:平面无结器件和无结SRAM的辐射性能

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The objective of this work is to analyze the radiation performance of the planar junctionless devices and junctionless device-based SRAMs. Bulk planar junctionless transistor (BPJLT) and silicon-on-insulator planar junctionless transistors (SOIPJLT) under heavy ions irradiation have been studied using TCAD simulations. 6T-SRAM cells built up of BPJLTs and SOIPJLTs have been investigated for their soft error performance. Even though the bipolar amplification of the SOIPJLT is more compared to BPJLT, the soft error performance of the SOIPJLT SRAM is better compared to BPJLT SRAM.
机译:这项工作的目的是分析平面无结器件和基于无结器件的SRAM的辐射性能。使用TCAD模拟研究了重离子辐照下的体平面无结晶体管(BPJLT)和绝缘体上硅无平面结晶体管(SOIPJLT)。已经研究了由BPJLT和SOIPJLT构成的6T-SRAM单元的软错误性能。尽管SOIPJLT的双极放大率比BPJLT高,但SOIPJLT SRAM的软错误性能却比BPJLT SRAM好。

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