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首页> 外文期刊>Journal of Computational Electronics >Electrostatically doped tunnel CNTFET model for low-power VLSI circuit design
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Electrostatically doped tunnel CNTFET model for low-power VLSI circuit design

机译:用于低功耗VLSI电路设计的静电掺杂隧道CNTFET模型

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摘要

With advantages such as low sub-threshold swing, low OFF-state current and the ability to attain a higher ON–OFF ratio, the tunnel CNTFET is one of the most comprehensively investigated devices for low-power application. The problems associated with this device are fabrication issues since conventional doping is not possible in CNTs. Therefore, a doping-less tunnel CNTFET is proposed which is free from problems associated with a conventional tunnel CNTFET. A mathematical model is developed for an electrostatically doped tunnel CNTFET, and to validate the model accuracy and the equation set, the simulation results are compared with NanoTCAD ViDES results. Finally, the developed model is deployed in an inverter design to verify the suitability of the model for circuit applications.
机译:凭借低亚阈值摆幅,低截止状态电流以及能够获得更高的导通/截止比的优势,隧道CNTFET是研究最广泛的低功耗应用之一。与该装置有关的问题是制造问题,因为在CNT中不可能进行常规掺杂。因此,提出了无掺杂隧道CNTFET,其没有与常规隧道CNTFET相关的问题。开发了用于静电掺杂隧道CNTFET的数学模型,并且为了验证模型的准确性和方程组,将模拟结果与NanoTCAD ViDES结果进行了比较。最后,将开发的模型部署在逆变器设计中,以验证该模型对电路应用的适用性。

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