首页> 外文期刊>Journal of Applied Physics >Radiation Blistering: Interferometric and Microscopic Observations of Oxides, Silicon, and Metals
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Radiation Blistering: Interferometric and Microscopic Observations of Oxides, Silicon, and Metals

机译:辐射起泡:氧化物,硅和金属的干涉和显微镜观察

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摘要

Photographs and descriptions of the phenomena are given. Most of the observations were of magnesium oxide, a few were of spinel and corundum. The fringe systems arising from a blister (two films on a substrate) are described. Results are given for miscellaneous H+, D+, He+, and He++ bombardments, 0.025–4 MeV. Measurements are given of blister heights, diameters, shell thicknesses, and depths of cavities left after blister shells break away (exfoliate). Effects arising from superficial deposited films are described. Blistering was found on polycrystalline copper bombarded with H+ or He+ and on polycrystalline nickel with He+ only. Blistering was not found on several other metals bombarded similarly. For the oxides, blistering was first noted at ∼3×1017, while for the metals at ∼8×1017. The effects of gas permeability, radiation expansion, and elastic moduli on blister growth are discussed. The dispersion of refractive index of magnesium oxide is given.
机译:给出了现象的照片和描述。大部分观察结果是氧化镁,少数是尖晶石和刚玉。描述了由水泡引起的边缘系统(在基材上有两层薄膜)。给出了0.025–4 MeV的杂种H +,D +,He +和He ++轰击的结果。给出了泡罩高度,直径,壳体厚度以及泡罩破裂(脱落)后留下的空腔深度的测量值。描述了由表面沉积膜产生的效果。在用H +或He +轰击的多晶铜和仅用He +轰击的多晶镍上发现起泡。在其他几种类似轰炸的金属上也未发现起泡。对于氧化物,起泡首先在〜3×1017处注意到,而对于金属在〜8×1017处。讨论了气体渗透率,辐射膨胀和弹性模量对水泡生长的影响。给出了氧化镁的折射率分散。

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  • 来源
    《Journal of Applied Physics》 |1966年第6期|共8页
  • 作者

    Primak William; Luthra Jagdish;

  • 作者单位

    Argonne National Laboratory, Argonne, Illinois;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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